2013-09-02

Aixtron MOCVD System Used by Japanese Gas Manufacturer to Develop GaN-on-SiC-on-Si

Aixtron SE announced gas manufacturer Air Water Inc. based in Azumino, Japan has successfully installed a fully automated AIX G5 HT Planetary Reactorin a 8x6-inch configuration for the growth of GaN epitaxial layers. Following the system installation, the company has announced the release of GaN-on-SiC on silicon substrates for this year.
Continue reading

WG Tech recently held an in-depth online discussion with Dr. Adi Abileah, former Chief Scientist at Planar Systems and a SID Fellow, to exchange insights on glass substrate based MiniLED technology innovation. Dr. Abileah, a globally respected... READ MORE

Signify, the world leader in lighting, launches Puzzle – the first luminaire of its kind to combine striking, continuous light with office compliance, task-ready performance and a breakthrough in sustainable design using 75% recycled PET... READ MORE